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    Silicon Nitride Ceramic Substrate Sintering Furnace 先进陶瓷
    Horizontal gas press sintering furnace for sintering silicon nitride ceramic substrate
    Online inquiry and order
    details

    Use

    Mainly used for sintering silicon nitride ceramic substrate.

    Main configuration:

    1. double layer shell design with built-in water cooling jacket, 

    furnace shell of 16MnR pressure vessel steel.

    2. Heating element of isostatic graphite rod, electric resistance heating.

    3 Gas-in system owns relief valve and pressure relay, reliable and safe

    4. Automatic control mode of PLC plus touching screen.

    5. A fast cooling blower equipped with the end of furnace accelerates the cooling of furnace. 

     Main technical parameters:

    1.Max. temperature：2100℃,

    2.Working temperature：2000℃

    3.Gas pressure:1MPa.

    4. Final vacuum: 1Pa.
    5.Working zone    ：600X600X1400mm（WXHXD）


    Furnace can be customized on your request. 


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